The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Nov. 19, 2008
Applicants:

Padma Gopalan, Madison, WI (US);

Eungnak Han, Madison, WI (US);

Inventors:

Padma Gopalan, Madison, WI (US);

Eungnak Han, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/14 (2006.01); C08F 212/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.


Find Patent Forward Citations

Gopalan, Padma. (2013). Photopatternable imaging layers for controlling block copolymer microdomain orientation (U.S. Patent No. 8362179). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8362179

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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