The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Feb. 20, 2009
Applicants:

Osamu Nakayama, Niigata, JP;

Takashi Fukumoto, Niigata, JP;

Inventors:

Osamu Nakayama, Niigata, JP;

Takashi Fukumoto, Niigata, JP;

Assignee:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 228/06 (2006.01); C08F 224/00 (2006.01); C07D 327/02 (2006.01); C07D 327/06 (2006.01); C07D 319/12 (2006.01); C07D 323/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. (wherein n represents an integer of 0 to 2; Rrepresents a hydrogen atom, methyl or the like; Rto Reach represent independently a hydrogen atom, a linear alkyl group, a branched alkyl group or the like; and A and B each represent independently an oxygen atom or a sulfur atom).


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