The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Dec. 02, 2010
Applicants:

Yoshitaka Kubota, Kanagawa, JP;

Takuji Onuma, Kanagawa, JP;

Inventors:

Yoshitaka Kubota, Kanagawa, JP;

Takuji Onuma, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/46 (2006.01); H01L 21/82 (2006.01); H01L 29/00 (2006.01); H01L 23/525 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for programming an anti-fuse element in which the ratio between current values before and after writing is increased to ensure accuracy in making a judgment about how writing has been performed on the anti-fuse element. The method for programming the anti-fuse element as a transistor includes the steps of applying a prescribed gate voltage to a gate electrode to break down a gate dielectric film, and moving the silicide material of a silicide layer formed on a surface of at least one of a first impurity diffusion region and a second impurity diffusion region, into the gate dielectric film in order to couple the gate electrode with at least the one of the first impurity diffusion region and the second impurity diffusion region electrically through the silicide material.


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