The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Jan. 15, 2008
Keon-woo Lee, Daejeon, KR;
Sung-hyun Kim, Daejeon, KR;
Chang-ho Cho, Daejeon, KR;
Dong-kung OH, Daejeon, KR;
Min-young Lim, Sungnam-si, KR;
Ji-heum Yoo, Daejeon, KR;
Sang-kyu Kwak, Daejeon, KR;
Keon-Woo Lee, Daejeon, KR;
Sung-Hyun Kim, Daejeon, KR;
Chang-Ho Cho, Daejeon, KR;
Dong-Kung Oh, Daejeon, KR;
Min-Young Lim, Sungnam-si, KR;
Ji-Heum Yoo, Daejeon, KR;
Sang-Kyu Kwak, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.