The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Nov. 14, 2008
Applicants:

Seiji Nakajima, Kyoto, JP;

Tetsuo Hayase, Kyoto, JP;

Tetsuya Mori, Kyoto, JP;

Inventors:

Seiji Nakajima, Kyoto, JP;

Tetsuo Hayase, Kyoto, JP;

Tetsuya Mori, Kyoto, JP;

Assignee:

OMRON Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/08 (2006.01); B32B 15/04 (2006.01); B05D 3/10 (2006.01); C08G 63/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides (i) a process for producing a metal film with which process a metal film and a metal pattern can be formed, at low cost, on an arbitrary substrate, (ii) a primer composition, (iii) a metal film, and (iv) use of the metal film. The process includes the steps of: forming an organic film with use of a primer composition which contains (i) an addition polymerizable compound including three or more reactive groups, (ii) an addition polymerizable compound including an acid group, (iii) an addition polymerizable compound including a basic group, and (iv) an addition polymerizable compound including a hydrophilic functional group; form a metal (M1) salt from the acid group; substituting the metal (M1) salt of the acid group with a metal (M2) salt by processing with a metal (M2) ion aqueous solution containing a metal (M2) ion which has a less ionization tendency than the metal (M1) ion; and reducing the metal (M2) ion so that a metal film is formed on a surface of the organic film.


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