The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2013

Filed:

Oct. 27, 2009
Applicants:

Edward B. Fletcher, Austin, TX (US);

Zhengmao YE, Austin, TX (US);

Dwayne L. Labrake, Cedar Park, TX (US);

Frank Y. Xu, Round Rock, TX (US);

Inventors:

Edward B. Fletcher, Austin, TX (US);

Zhengmao Ye, Austin, TX (US);

Dwayne L. LaBrake, Cedar Park, TX (US);

Frank Y. Xu, Round Rock, TX (US);

Assignee:

Molecular Imprints, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate.


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