The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Oct. 27, 2008
Duli Mao, Sunnyvale, CA (US);
Sohei Manabe, San Jose, CA (US);
Vincent Venezia, Sunnyvale, CA (US);
Hsin-chih Tai, Cupertino, CA (US);
Hidetoshi Nozaki, Sunnyvale, CA (US);
Yin Qian, Milpitas, CA (US);
Howard E. Rhodes, San Martin, CA (US);
Duli Mao, Sunnyvale, CA (US);
Sohei Manabe, San Jose, CA (US);
Vincent Venezia, Sunnyvale, CA (US);
Hsin-Chih Tai, Cupertino, CA (US);
Hidetoshi Nozaki, Sunnyvale, CA (US);
Yin Qian, Milpitas, CA (US);
Howard E. Rhodes, San Martin, CA (US);
OmniVision Technologies, Inc., Santa Clara, CA (US);
Abstract
An array of pixels is formed using a substrate, where each pixel has a substrate having a backside and a frontside that includes metalization layers, a photodiode formed in the substrate, frontside P-wells formed using frontside processing that are adjacent to the photosensitive region, and an N-type region formed in the substrate below the photodiode. The N-type region is formed in a region of the substrate below the photodiode and is formed at least in part in a region of the substrate that is deeper than the depth of the frontside P-wells.