The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Aug. 04, 2011
Applicant:
Yigong Wang, Rutland, MA (US);
Inventor:
Yigong Wang, Rutland, MA (US);
Assignee:
Allegro Microsystems, Inc., Worcester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/82 (2006.01);
U.S. Cl.
CPC ...
Abstract
A Hall effect element includes a Hall plate having geometric features selected to result in a highest ratio of a sensitivity divided by a plate resistance. The resulting shape is a so-called 'wide-cross' shape.
Wang, Yigong. (2013). Hall effect element having a wide cross shape with dimensions selected to result in improved performance characteristics (U.S. Patent No. 8357983). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8357983
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile