The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2013

Filed:

Oct. 06, 2009
Applicants:

Katsuji Takagi, Kanagawa, JP;

Akio Machida, Kanagawa, JP;

Toshio Fujino, Kanagawa, JP;

Tadahiro Kono, Kanagawa, JP;

Norio Fukasawa, Kanagawa, JP;

Shinsuke Haga, Kanagawa, JP;

Inventors:

Katsuji Takagi, Kanagawa, JP;

Akio Machida, Kanagawa, JP;

Toshio Fujino, Kanagawa, JP;

Tadahiro Kono, Kanagawa, JP;

Norio Fukasawa, Kanagawa, JP;

Shinsuke Haga, Kanagawa, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An embodiment of the invention provides a laser annealing method, including the steps of radiating a laser beam to an amorphous film on a substrate while scanning the laser beam for the amorphous film, crystallizing the amorphous film, detecting a light quantity of laser beam reflected from the substrate and a scanning speed of the laser beam while the radiation and the scanning of the laser beam are carried out for the amorphous film, and controlling a radiation level and the scanning speed of the laser beam based on results of comparison of the light quantity of laser beam reflected from the substrate, and the scanning speed of the laser beam with respective preset references.


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