The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Dec. 10, 2010
Walter Schwarzenbach, Saint Nazaire les Eymes, FR;
Aziz Alami-idrissi, Le Touvet, FR;
Alexandre Chibko, Saint Nazaire les Eymes, FR;
Sébastien Kerdiles, Saint Ismier, FR;
Walter Schwarzenbach, Saint Nazaire les Eymes, FR;
Aziz Alami-Idrissi, Le Touvet, FR;
Alexandre Chibko, Saint Nazaire les Eymes, FR;
Sébastien Kerdiles, Saint Ismier, FR;
Soitec, Bernin, FR;
Abstract
The invention relates to a method for routing a chamfered substrate, having applications in the field of electronics, optics, or optoelectronics, which involves depositing a layer of a protective material on a peripheral annular zone of the substrate preferably with the aid of a plasma, partially etching the protective material with the aid of a plasma, so as to preserve a protective ring of the deposited material on the front face of the substrate, this ring located at a distance from the edge of the substrate, so as to delimit an accessible peripheral annular zone, etching a thickness of the material constituting the substrate to be routed, preferably with the aid of a plasma that is level with the accessible peripheral annular zone of the substrate, and removing the ring of protective material preferably with the aid of a plasma.