The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Apr. 11, 2008
Han-soo Kim, Daejeon, KR;
Min-young Lim, Sungnam-si, KR;
Yoon-hee Heo, Daejeon, KR;
Ji-heum Yoo, Daejeon, KR;
Sung-hyun Kim, Daejeon, KR;
Kwang-han Park, Daejeon, KR;
Han-Soo Kim, Daejeon, KR;
Min-Young Lim, Sungnam-si, KR;
Yoon-Hee Heo, Daejeon, KR;
Ji-Heum Yoo, Daejeon, KR;
Sung-Hyun Kim, Daejeon, KR;
Kwang-Han Park, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.