The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Aug. 30, 2010
Applicants:
Lijie Zhao, Pleasanton, CA (US);
Wei Zhang, Fremont, CA (US);
Hongping Yuan, Fremont, CA (US);
Inventors:
Assignee:
Western Digital (Fremont), LLC, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of removing photoresist beneath an overlayer includes estimating a rapid temperature change for a photoresist layer to produce cracking in the overlayer. The temperature chance is estimated so that the cracking of the overlayer is sufficient to allow a liftoff solution to penetrate below the overlayer during a liftoff step. The method further includes baking the photoresist layer and chilling the photoresist layer after baking to produce the rapid temperature change. The method then includes lifting off the photoresist layer using the liftoff solution.