The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2013
Filed:
Oct. 09, 2008
Yuzuru Miyazawa, Tokyo, JP;
Yoshihiko Kobayashi, Kawasaki, JP;
Kenji Haraya, Tsukuba, JP;
Miki Yoshimune, Tsukuba, JP;
Yuzuru Miyazawa, Tokyo, JP;
Yoshihiko Kobayashi, Kawasaki, JP;
Kenji Haraya, Tsukuba, JP;
Miki Yoshimune, Tsukuba, JP;
Taiyo Nippon Sanso Corporation, Tokyo, JP;
Abstract
A gas purification method of the present invention uses a carbon membrane having a molecular sieving action to purify at least one selected from the group consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing an impurity at 10 ppm or less. The present invention can be used for a recovery unit that recoveries a used gas to reuse it as an ultrapure semiconductor material gas, and a unit or equipment that produces or charges an ultrapure semiconductor material gas.