The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8357227 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 22, 2013

Filed:

Apr. 15, 2003
Applicant:

Raimo Leimala, Pori, FI;

Inventor:

Raimo Leimala, Pori, FI;

Assignee:

Outotec Oyj, Espoo, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22B 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method for the removal of metal impurities in chloride-based copper recovery processes. The amount of impurities in a strong chloride solution of monovalent copper can be reduced according to the method down to very low levels by using ion exchange as at least one purification stage.


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Leimala, Raimo. (2013). Method for the purification of copper chloride solution (U.S. Patent No. 8357227). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8357227

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