The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2013

Filed:

Jul. 20, 2009
Applicants:

Yossef Ori Adanny, Mitzpe, IL;

Genady Nahshon, Binyamina, IL;

Baruch Levine, Afula, IL;

Avner Rosenberg, Beit-Shearim, IL;

Inventors:

Yossef Ori Adanny, Mitzpe, IL;

Genady Nahshon, Binyamina, IL;

Baruch Levine, Afula, IL;

Avner Rosenberg, Beit-Shearim, IL;

Assignee:

Syneron Medical Ltd., Yoqneam Illit, IL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61B 18/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

RF skin treatment is provided by applying to the skin an applicator that includes a tip populated by at least one voltage to skin delivering element and an isolating transformer located proximate to the tip to reduce ground currents through parasitic capacitance. The skin impedance is monitored during an RF treatment pulse to ensure that a sufficient amount of energy is delivered to the skin to cause a desired effect. The pulse energy can be increased if the skin impedance is too low. In addition, pain can be alleviated by cutting off the RF pulse if the skin impedance is too high. Further, inefficient RF pulses can be excluded by cutting off the RF energy supply if the skin impedance is too low.


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