The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2013

Filed:

Nov. 04, 2011
Applicants:

Naruyoshi Mita, Sodegaura, JP;

Mitsuaki Chida, Sodegaura, JP;

Masaru Kawaguchi, Omuta, JP;

Kengo Otsuka, Sodegaura, JP;

Naoshi Nagai, Sodegaura, JP;

Takaaki Yamazaki, Tokyo, JP;

Tetsuya Ichihashi, Fujimi, JP;

Inventors:

Naruyoshi Mita, Sodegaura, JP;

Mitsuaki Chida, Sodegaura, JP;

Masaru Kawaguchi, Omuta, JP;

Kengo Otsuka, Sodegaura, JP;

Naoshi Nagai, Sodegaura, JP;

Takaaki Yamazaki, Tokyo, JP;

Tetsuya Ichihashi, Fujimi, JP;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Int. Cl.
CPC ...
C07D 401/14 (2006.01); C08K 5/3492 (2006.01); C08L 101/00 (2006.01); C09K 15/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A novel polyamine derivative, or polyol derivative, having a piperidylaminotriazine skeleton; salts of such compounds; a process for producing them; an organic material stabilizer comprising any of such compounds; a method of stabilizing an organic material; and a stabilized organinc material. Compounds of the general formula: (1) (wherein X is N(R) or an oxygen atom; Ris an n-valent hydrocarbon group; Ris an hydrogen atom or an alkyl; Ris a hydrogen atom, an alkyl, an alkoxy or an acyl; Ris a hydrogen atom or an alkyl; and n is an integer of 3 to 16) are effective in the stabilization of an organic material against deterioration by light, heat, oxygen, ozone and electromagnetic waves, such as X-rays and γ-rays.


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