The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2013
Filed:
Sep. 11, 2009
Quanxi Jia, Los Alamos, NM (US);
Anthony K. Burrell, Los Alamos, NM (US);
Eve Bauer, Los Alamos, NM (US);
Filip Ronning, Los Alamos, NM (US);
Thomas Mark Mccleskey, Los Alamos, NM (US);
Guifu Zou, Los Alamos, NM (US);
Quanxi Jia, Los Alamos, NM (US);
Anthony K. Burrell, Los Alamos, NM (US);
Eve Bauer, Los Alamos, NM (US);
Filip Ronning, Los Alamos, NM (US);
Thomas Mark McCleskey, Los Alamos, NM (US);
Guifu Zou, Los Alamos, NM (US);
Los Alamos National Security, LLC, Los Alamos, NM (US);
Abstract
Highly ordered Ge films are prepared directly on single crystal Si substrates by applying an aqueous coating solution having Ge-bound polymer onto the substrate and then heating in a hydrogen-containing atmosphere. A coating solution was prepared by mixing water, a germanium compound, ethylenediaminetetraacetic acid, and polyethyleneimine to form a first aqueous solution and then subjecting the first aqueous solution to ultrafiltration.