The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2013
Filed:
Apr. 27, 2007
Dick Scholten, Stuttgart, DE;
Julia Cassemeyer, Reutlingen, DE;
Michael Stumber, Korntal-Muenchingen, DE;
Franz Laermer, Weil Der Stadt, DE;
Ando Feyh, Tamm, DE;
Christian Maeurer, Aachen, DE;
Dick Scholten, Stuttgart, DE;
Julia Cassemeyer, Reutlingen, DE;
Michael Stumber, Korntal-Muenchingen, DE;
Franz Laermer, Weil Der Stadt, DE;
Ando Feyh, Tamm, DE;
Christian Maeurer, Aachen, DE;
Robert Bosch GmbH, Stuttgart, DE;
Abstract
A method for producing porous microneedles () situated in an array on a silicon substrate includes: providing a silicon substrate, applying a first etching mask, patterning microneedles using a DRIE process ('deep reactive ion etching'), removing the first etching mask, at least partially porosifying the Si substrate, the porosification beginning on the front side of the Si substrate and a porous reservoir being formed.