The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2013
Filed:
Dec. 05, 2011
Susanne Klaschka, Nuremberg, DE;
Matthew Ryan, Appleton, WI (US);
Susanne Klaschka, Nuremberg, DE;
Matthew Ryan, Appleton, WI (US);
Voith Patent GmbH, Heidenheim, DE;
Abstract
A process for preparing a seam area for a PMC base fabric includes the steps of: providing a PMC base fabric including a plurality of warp yarns extending in a machine direction (MD) and a plurality of interwoven weft yarns extending in a cross machine direction (CD); removing a plurality of adjacent weft yarns from the PMC base fabric to define a window of warp yarns not interwoven with weft yarns, the plurality of warp yarns being interwoven with a plurality of weft yarns on either side of the window; folding over the PMC base fabric at the window such that each warp yarn substantially aligns with itself in the MD, and one or more weft yarns on one side of the window substantially align with a respective weft yarn on an opposite side of the window; and bonding together a portion of the PMC base fabric adjacent the window.