The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8352892 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 08, 2013

Filed:

Jul. 06, 2011
Applicants:

Manabu Hakko, Utsunomiya, JP;

Miyoko Kawashima, Haga-gun, JP;

Inventors:

Manabu Hakko, Utsunomiya, JP;

Miyoko Kawashima, Haga-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a generation method that obtains a position at which an auxiliary pattern is to be placed and generates a mask pattern (its data), which achieves excellent imaging performance, even when a halftone mask is used as an original.


Find Patent Forward Citations

Hakko, Manabu. (2013). Method, computer-readable storage medium, and apparatus for generating a mask data and fabricating process (U.S. Patent No. 8352892). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8352892

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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