The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Feb. 14, 2011
Applicants:

Sosuke Akao, Tokyo, JP;

Yuji Kubo, Tokyo, JP;

Noritaka Mihashi, Tokyo, JP;

Godai Fukunaga, Tokyo, JP;

Masashi Aimatsu, Tokyo, JP;

Takeshi Itoi, Tokyo, JP;

Inventors:

Sosuke Akao, Tokyo, JP;

Yuji Kubo, Tokyo, JP;

Noritaka Mihashi, Tokyo, JP;

Godai Fukunaga, Tokyo, JP;

Masashi Aimatsu, Tokyo, JP;

Takeshi Itoi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
Abstract

A retardation layer that includes regions causing different retardations can be manufactured easily. A retardation substrate includes a substrate and a solidified liquid crystal layer facing its main surface. The solidified liquid crystal layer includes first to third regions, and a degree of depolarization for each of the regions is less than 5.0×10. A difference between the maximum and minimum values of the degrees of depolarization obtained for the regions is less than 2.0×10.


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