The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Oct. 10, 2006
Applicants:
Daniel Gaebler, Ilmenau, DE;
Konrad Bach, Tiefthal, DE;
Inventors:
Daniel Gaebler, Ilmenau, DE;
Konrad Bach, Tiefthal, DE;
Assignee:
X-FAB Semiconductor Foundries AG, Erfurt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01); H01J 5/16 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to methods and devices comprising a nanostructure () for improving the optical behavior of components and apparatuses and/or improving the behavior of sensors by increasing the active surface area. The nanostructure () is produced by means of a special RIE etching process, can be modified regarding the composition of the materials thereof, and can be provided with adequate coatings. The amount of material used for the base layer () can be reduced by supplying a buffer layer (). Many applications are disclosed.