The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
May. 23, 2011
Hae-sung Kim, Hwaseong-si, KR;
Hyoung-soo Ko, Seoul, KR;
Seung-bum Hong, Seongnam-si, KR;
Jin-seung Sohn, Seoul, KR;
Sung-hoon Choa, Seoul, KR;
Chee-kheng Lim, Suwon-si, KR;
Hae-sung Kim, Hwaseong-si, KR;
Hyoung-soo Ko, Seoul, KR;
Seung-bum Hong, Seongnam-si, KR;
Jin-seung Sohn, Seoul, KR;
Sung-hoon Choa, Seoul, KR;
Chee-kheng Lim, Suwon-si, KR;
Abstract
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.