The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Jun. 27, 2008
Applicants:

Weimin SI, Pleasanton, CA (US);

Liubo Hong, San Jose, CA (US);

Honglin Zhu, Fremont, CA (US);

Winnie Yu, San Jose, CA (US);

Rowena Schmidt, Gilroy, CA (US);

Inventors:

Weimin Si, Pleasanton, CA (US);

Liubo Hong, San Jose, CA (US);

Honglin Zhu, Fremont, CA (US);

Winnie Yu, San Jose, CA (US);

Rowena Schmidt, Gilroy, CA (US);

Assignee:

Western Digital (Fremont), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); G11B 5/127 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system provide a magnetoresistive structure from a magnetoresistive stack that includes a plurality of layers. The method and system include providing a mask that exposes a portion of the magnetoresistive stack. The mask has at least one side, a top, and a base at least as wide as the top. The method and system also include removing the portion of the magnetoresistive stack to define the magnetoresistive structure. The method and system further include providing an insulating layer. A portion of the insulating layer resides on the at least one side of the mask. The method and system further include removing the portion of the insulating layer on the at least one side of the mask and removing the mask.


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