The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Oct. 20, 2010
Applicants:

Mark A. Hackler, Ocean, NJ (US);

Rajgopal Subramanian, Robbinsville, NJ (US);

Inventors:

Mark A. Hackler, Ocean, NJ (US);

Rajgopal Subramanian, Robbinsville, NJ (US);

Assignee:

E I du Pont de Nemours and Company, Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 11/00 (2006.01); G03C 5/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention pertains to a method for rebalancing a solvent solution useful for treating photosensitive printing elements having a photopolymerizable layer. The solvent solution becomes contaminated with unpolymerized material and other materials that release from the photosensitive printing elements during washout treating, and separation of contaminates also removes some of one or more components in the used solvent solution. The method rebalances the proportion of the components in a solvent solution having 3 or more components. The method includes measuring a reclaimant, which has been separated from the contaminates, for two or more properties, calculating a mass of the components to be added to the reclaimant based on an equation generated for each measured property, and adding the mass of the component or components to the reclaimant to adjust the proportion of the components in the reclaimant to targeted proportions.


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