The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Dec. 21, 2005
Applicants:

Marc Silva, Roanoke, VA (US);

James Daniel Riall, Flagstaff, AZ (US);

Jean-marc Padiou, Champigny sur Marne, FR;

Loïc Quere, La Varenne Saint Hilaire, FR;

Inventors:

Marc Silva, Roanoke, VA (US);

James Daniel Riall, Flagstaff, AZ (US);

Jean-Marc Padiou, Champigny sur Marne, FR;

Loïc Quere, La Varenne Saint Hilaire, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polishing wheel () arranged to polish an article. The polishing wheel comprises a hub () provided with an axial cavity () coaxial with an axis (). The polishing wheel further comprises a substrate layer () being made of an elastomer material affixed to the hub () and coaxial with the axis (). The substrate layer () has an outer surface () having a substantially symmetrical shape with respect to the axis (). The polishing wheel () further comprises a continuous cover layer () affixed to the outer surface () and coaxial with the axis (). The continuous cover layer () is made of an elastomer material covering substantially entirely the outer surface ().


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