The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2013

Filed:

Aug. 03, 2010
Applicant:

Taisuke Murata, Tokyo, JP;

Inventor:

Taisuke Murata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 21/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

An enclosure of a dichroic mirror system that synthesizes a plurality of monochromatic laser beams emitted from a laser light source to output synthesized light is a structure having a dichroic mirror system lower enclosure and a dichroic mirror system upper enclosure joined to each other, and includes a light-leakage protecting structure that is formed by a convex portion formed at an end of the dichroic mirror system lower enclosure and a concave portion formed at an end of the dichroic mirror system upper enclosure engaged with each other at a joint therebetween.


Find Patent Forward Citations

Loading…