The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Apr. 25, 2005
Tetsuro Mizushima, Moriguchi, JP;
Jiro Yoshinari, Tokyo, JP;
Takuya Tsukagoshi, Sagamihara, JP;
Hideaki Miura, Tokyo, JP;
Hideki Sunohara, Tokyo, JP;
Rie Ihara, Tokyo, JP;
Tetsuro Mizushima, Moriguchi, JP;
Jiro Yoshinari, Tokyo, JP;
Takuya Tsukagoshi, Sagamihara, JP;
Hideaki Miura, Tokyo, JP;
Hideki Sunohara, Tokyo, JP;
Rie Ihara, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
The present invention provides a hologram recording material which is not required to be subjected to pre-exposure treatment at the time of recording, attains high refractive index change, high sensitivity, low scattering, environment resistance, durability, low dimensional change, and high multiplicity, and is suitable for volume hologram recording. Also, the present invention provides a hologram recording medium. A hologram recording material comprising a matrix material having a softening temperature of 50° C. or higher, and a photopolymerizable monomer which is in a liquid phase state at room temperature. The matrix material is preferably contained in an amount of 50% by weight or more and 90% by weight or less of the whole of the hologram recording material. A softening temperature of the hologram recording material is preferably 0° C. or higher.