The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2013
Filed:
Feb. 24, 2010
Jong-won Hong, Yongin, KR;
Min-jae Jeong, Yongin, KR;
Heung-yeol NA, Yongin, KR;
Eu-gene Kang, Yongin, KR;
Seok-rak Chang, Yongin, KR;
Jong-Won Hong, Yongin, KR;
Min-Jae Jeong, Yongin, KR;
Heung-Yeol Na, Yongin, KR;
Eu-Gene Kang, Yongin, KR;
Seok-Rak Chang, Yongin, KR;
Samsung Display Co., Ltd., Yongin, KP;
Abstract
Provided are a source gas supply unit capable of supplying a constant amount of source gas to a deposition chamber to deposit a uniform layer, and a deposition apparatus and method using the same. The source gas supply unit includes a canister in which a source is stored, a heater heating the canister, a source gas supply pipe provided on one side of the canister, a measuring unit installed on the source gas supply pipe and measuring an amount of source gas passing through the source gas supply pipe, and a temperature controller connected to the heater and the measuring unit. The temperature controller controls the heater based on the amount of the source gas measured by the measuring unit.