The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Jul. 13, 2006
Kouichirou Tsujita, Utsunomiya, JP;
Kouichirou Tsujita, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
An exposure method for exposing a pattern of a reticle which includes a first pattern and a second pattern by using a light from a light source and an optical system includes the steps of obtaining information relating to the first pattern and plural types of representative patterns that can be used for the second pattern, and setting, for the first pattern and the plural types of representative patterns, (i) at least one exposure parameter of the light source and the optical system or (ii) a size or shape of the first pattern and the plural types of representative patterns.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile