The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2012

Filed:

May. 27, 2009
Applicants:

Daniel J. Theis, Mahtomedi, MN (US);

Levent Biyikli, Cedar Park, TX (US);

Jeffrey H. Tokie, Scandia, MN (US);

David L. Hofeldt, Oakdale, MN (US);

Inventors:

Daniel J. Theis, Mahtomedi, MN (US);

Levent Biyikli, Cedar Park, TX (US);

Jeffrey H. Tokie, Scandia, MN (US);

David L. Hofeldt, Oakdale, MN (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method includes providing a substrate having a layer of photosensitive material thereon and a mask having contiguous first, second, and third portions; and sequentially: i) scanning the first portion with a light beam at a first rate and subsequently impinges on the photosensitive material at an exposure zone; ii) fixing the scanning within the second portion; and iii) resuming scanning through the third portion. Throughout the process the substrate moves through the exposure zone. An apparatus for carrying out the process includes a light beam source, a mask mount, a mask stage, a conveyor assembly, and at least one optical element for manipulating the light beam into a rectangular light beam.


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