The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2012

Filed:

Jul. 25, 2008
Applicants:

Takashi Yamada, Tokyo, JP;

Naomi Sato, Tokyo, JP;

Koichi Kimijima, Tokyo, JP;

Inventors:

Takashi Yamada, Tokyo, JP;

Naomi Sato, Tokyo, JP;

Koichi Kimijima, Tokyo, JP;

Assignee:

Adeka Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/027 (2006.01); C07D 209/82 (2006.01); C07D 209/86 (2006.01); C08G 59/17 (2006.01); C08F 299/02 (2006.01); C08F 2/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

An alkali developable photosensitive resin composition contains (J) a photopolymerizable unsaturated compound having a structure resulting from the addition reaction of (B) a compound having a β-diketone moiety or a compound having a β-ketoester group to the (meth)acryloyl group of (A) a compound having at least two (meth)acryloyl groups and a hydroxyl group and subsequent esterification of the hydroxyl group of the resulting addition product with (C) a polybasic acid anhydride. The compound having a β-diketone moiety is preferably a novel β-diketone compound represented by general formula (I): wherein Ris a C1-C20 alkyl group; Rrepresents R, OR, COR, SR, CONRR, or CN; R, R, and Rare each hydrogen, a C1-C20 alkyl group, etc.; a is 0 to 3; and b is 0 to 4.


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