The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Jun. 10, 2008
Qing Dai, San Jose, CA (US);
Xing-cai Guo, Tracy, CA (US);
Dan Saylor Kercher, Santa Cruz, CA (US);
Mike Suk, Palo Alto, CA (US);
Qing Dai, San Jose, CA (US);
Xing-Cai Guo, Tracy, CA (US);
Dan Saylor Kercher, Santa Cruz, CA (US);
Mike Suk, Palo Alto, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method for planarizing a magnetic recording disk that has surface features of elevated lands and recessed grooves includes forming two coatings of cured perfluorinated polyether (PFPE) polymers over the surface features. The disk may have a protective carbon overcoat with a surface that replicates the topography of lands and grooves. A liquid functionalized-PFPE is applied over the disk surface and then cured to form a first coating with the functionalized end groups bonding to the carbon overcoat. A liquid non-functionalized-PFPE polymer is then applied over the functionalized-PFPE coating and cured to form a second coating. The combined coatings substantially planarize the disk surface so that there is minimal recession between the top of the coating over the lands and the top of the coating over the grooves.