The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2012

Filed:

Feb. 15, 2008
Applicants:

Kazuya Nishimura, Kyoto, JP;

Katsuhiro Tsuji, Kashiwazaki, JP;

Inventors:

Kazuya Nishimura, Kyoto, JP;

Katsuhiro Tsuji, Kashiwazaki, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

An arc plasma sourcefor evaporating a cathode material of a cathodeby arc discharge controlled by a magnetic field, comprising a magnetic field forming mechanismarranged outside the cathode for forming a magnetic field M in parallel to the center axis of the cathode near an evaporation surface; a supporting mechanismfor supporting the cathode; a cooling mechanismfor cooling the cathode; and a tapered ringbeing truncated cone shaped and having a through-hole into which the cathode penetrates along the axial direction of the through-hole, the tapered ring being arranged to be tapered toward the evaporation surface of the cathode; wherein the tapered ring is made of a ferromagnetic material and the front end of the tapered ring is positioned coplanar with the evaporation surface of the cathode or is positioned posterior to the evaporation surface in use.


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