The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Jul. 07, 2003
Richard Schmidt, Hammersbach, DE;
Karsten Bräuer, Bruchköbel, DE;
Richard Schmidt, Hammersbach, DE;
Karsten Bräuer, Bruchköbel, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiOparticles, and the SiOparticles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner () focuses the media flow toward the plasma zone () by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle () is designed so that it is focussed toward the plasma zone (). The focussing is effected by a tapering () of the media nozzle ().