The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Mar. 22, 2010
Pingshan LI, Sunnyvale, CA (US);
Gazi Ali, Santa Clara, CA (US);
Pingshan Li, Sunnyvale, CA (US);
Gazi Ali, Santa Clara, CA (US);
Sony Corporation, Tokyo, JP;
Abstract
A method and apparatus of depth of field rendering which simulates larger apertures for images captured at a smaller aperture. The depth of field rendering provides selective simulation of out-of-focus effects which are attainable with cameras having a larger aperture when capturing images at a smaller aperture. A blur function model is created based on the relationship between the blur change and the aperture change. This model is used to determine the blur difference which would arise between two images taken at two different apertures. Then the out-of-focus effect is generated by blurring the image in a rendering process based on the blur difference.