The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Feb. 11, 2010
Sheng-lih Yeh, Taipei, TW;
Shyh-tsong Lin, Taipei, TW;
Liang-chia Chen, Taipei, TW;
National Taipei University of Technology, Taipei, TW;
Abstract
An orthogonal-polarization Mirau interferometric system is provided, wherein a narrow-band or broad-band incident light is split into a reference light and an inspection light with the polarizations thereof being orthogonal to each other by using a beam-splitting module, while projecting the inspection light on a measured object to form an object light, and then the object light and the reference light are combined to form a combined light, and thereafter, an analyzer is utilized to modulate the polarizations and the intensities of the two lights for making the two lights interfere with each other and thus create an interference pattern. The polarization of the object light and that of the reference light can be adjusted by using an analyzer to become orthogonal to each other, and the intensities of the object light and the reference light can be adjusted to about the same for producing an interference pattern with high contrast.