The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2012

Filed:

Jun. 06, 2011
Applicants:

Paul Scott Carney, Urbana, IL (US);

Kimani C. Toussaint, Champaign, IL (US);

Brynmor J. Davis, Etna, NH (US);

Santosh Tripathi, Kathmandu, NP;

Inventors:

Paul Scott Carney, Urbana, IL (US);

Kimani C. Toussaint, Champaign, IL (US);

Brynmor J. Davis, Etna, NH (US);

Santosh Tripathi, Kathmandu, NP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A coherent confocal microscope and methods for measuring elements of the non-linear susceptibility of a nanoparticle, including, more particularly, all of the elements of the second-order susceptibility tensor of a single nanoparticle under permutation and Kleinman symmetry. Using a high numerical aperture lens, two-dimensional scanning and a vector beam shaper, the second-order nonlinear susceptibility is derived from a single confocal image. A forward model for the problem is presented and a computationally efficient data processing method robustly solves the inverse problem.


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