The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2012

Filed:

Oct. 31, 2008
Applicants:

Jinqiu Zhang, Fremont, CA (US);

Hai Sun, Milpitas, CA (US);

Hongping Yuan, Fremont, CA (US);

Tsung Yuan Chen, San Jose, CA (US);

Guanxiong LI, Fremont, CA (US);

Inventors:

Jinqiu Zhang, Fremont, CA (US);

Hai Sun, Milpitas, CA (US);

Hongping Yuan, Fremont, CA (US);

Tsung Yuan Chen, San Jose, CA (US);

Guanxiong Li, Fremont, CA (US);

Assignee:

Western Digital (Fremont), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask on the intermediate layer. The mask includes a line having at least one side. A hard mask layer is provided on the mask. At least a portion of the hard mask layer resides on the side(s) of the line. At least part of the hard mask layer on the side(s) of the line is removed. Thus, at least a portion of the line is exposed. The line is then removed, providing an aperture in the hard mask corresponding to the line. The method also includes forming a trench in the intermediate layer under the aperture. The trench top is wider than its bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.


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