The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Sep. 22, 2011
Shi-yong Yi, Seongnam, KR;
Kyoung-taek Kim, Incheon, KR;
Hyun-woo Kim, Seongnam, KR;
Dong-ki Yoon, Seoul, KR;
Shi-Yong Yi, Seongnam, KR;
Kyoung-Taek Kim, Incheon, KR;
Hyun-Woo Kim, Seongnam, KR;
Dong-Ki Yoon, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of second and third types of polymer blocks are formed on an area of the image layer between outer edges of the two nearest activated areas, from the block copolymer. At least one of the first, second, and third types of polymer blocks are removed to form a variety of mask structures.