The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Aug. 03, 2007
Wook-seong Lee, Seoul, KR;
Young-joon Baik, Seoul, KR;
Jeung-hyun Jeong, Gyeonggi-do, KR;
Ki-woong Chae, Chungcheongnam-Do, KR;
Wook-Seong Lee, Seoul, KR;
Young-Joon Baik, Seoul, KR;
Jeung-Hyun Jeong, Gyeonggi-do, KR;
Ki-Woong Chae, Chungcheongnam-Do, KR;
Abstract
In the method for depositing a material in the absence of a positive column, a discharge is generated between a cathode and an anode disposed to face each other in a reaction chamber by applying a DC voltage therebetween, and introducing reaction gas into the reaction chamber, thereby depositing a material on a substrate mounted on the anode and serving as a part of the anode, wherein the deposition of the material on the substrate is performed under a state that a cathode glow and an anode glow exist in a form of thin layers coating respectively the surfaces of the cathode and the substrate, while a positive column does not exist or is so small as to be negligible.