The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2012
Filed:
Aug. 21, 2007
Jiansheng Ding, Yantai, CN;
Yong Hua Shang, Yantai, CN;
Deqiang MA, Yantai, CN;
Jingquan Hao, Yantai, CN;
Peicheng Luo, Yantai, CN;
Shuang HU, Yantai, CN;
Jiansheng Ding, Yantai, CN;
Yong hua Shang, Yantai, CN;
Deqiang Ma, Yantai, CN;
Jingquan Hao, Yantai, CN;
Peicheng Luo, Yantai, CN;
Shuang Hu, Yantai, CN;
Ningbo Wanhua Polyurethanes Co., Ltd., Ningbo, Zhejiang Province, CN;
Abstract
The present invention relates to a hole-jetting type reactor and its applications, in particular to a process for the production of isocyanates by the phosgenation of aliphatic or aromatic diamines or triamines in the gas phase using this reactor. The present invention achieves a good mixing and reacting result of the gas-phase phosgenation reaction at a high temperature by improving the mixing of reactants in the reactor to reduce the possibility of forming swirls and eliminate negative pressure produced at a local jet area, which can finally reduce back-mixing and formation of solid by-products.