The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2012

Filed:

Nov. 14, 2006
Applicants:

Unkai Sato, Nagano, JP;

Koichiro Ichikawa, Nagano, JP;

Yoshinobu Nishimoto, Nagano, JP;

Yoshio Nakamura, Nagano, JP;

Tsuyoshi Hasegawa, Nagano, JP;

Masumi Iihama, Nagano, JP;

Inventors:

Unkai Sato, Nagano, JP;

Koichiro Ichikawa, Nagano, JP;

Yoshinobu Nishimoto, Nagano, JP;

Yoshio Nakamura, Nagano, JP;

Tsuyoshi Hasegawa, Nagano, JP;

Masumi Iihama, Nagano, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

The method of polishing a work is capable of reducing a polishing cost, polishing a surface of the work with high polishing accuracy and easily disposing used polishing liquid and used washing liquid. The method comprises the steps of: pressing the work onto a polishing member; feeding polishing liquid; and relatively moving the work with respect to the polishing member. Electrolytic reduced water produced by electrolyzing an electrolyte solution is used as the polishing liquid.


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