The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 18, 2012

Filed:

Nov. 29, 2006
Applicants:

William J. Bertrand, Ventura, CA (US);

Lori C. Speckman, Ventura, CA (US);

Javier J. Reveles, Goleta, CA (US);

Andy R. Kiehl, Oakview, CA (US);

Inventors:

William J. Bertrand, Ventura, CA (US);

Lori C. Speckman, Ventura, CA (US);

Javier J. Reveles, Goleta, CA (US);

Andy R. Kiehl, Oakview, CA (US);

Assignee:

Medtronic, Inc., Minneapolis, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61M 5/00 (2006.01); A61M 39/00 (2006.01); A61M 29/00 (2006.01); A61M 25/00 (2006.01); A61M 25/14 (2006.01); A61F 2/02 (2006.01); A61F 2/04 (2006.01); A61F 2/82 (2006.01);
U.S. Cl.
CPC ...
Abstract

An implantable shunt that includes one or more catheters configured so that the implantable shunt has a resistance to flow greater than about 3 mm Hg/mL/minute. An implantable shunt system that includes one or more catheters and a fluid control device that utilizes the properties of the catheters to improve the expected function of the shunt by providing a higher or lower resistance to the flow through the shunt and reduces the effect of pulsations of cerebrospinal fluid on the shunt system.


Find Patent Forward Citations

Loading…