The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Jul. 29, 2009
Sajan Marokkey, Wappingers Falls, NY (US);
Wai-kin LI, Poughkeepsie, NY (US);
Todd C. Bailey, Fishkill, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Wai-Kin Li, Poughkeepsie, NY (US);
Todd C. Bailey, Fishkill, NY (US);
Infineon Technologies AG, Neubiberg, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A lithography system with a stray light feedback system is disclosed. The stray light feedback helps control critical dimension (CD) within a stray light specification limit. A stray light dose control factor is calculated as a function of the stray light measured in the exposure tool and the sensitivity of the resist. The stray light dose control factor is used to adjust the exposure dose to achieve the desired CD. The stray light may be monitored, and if a threshold level of stray light is reached or exceeded, the use of the exposure tool may be discontinued for a particular type of semiconductor product, resist, or mask level, until the lens system is cleaned.