The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Nov. 30, 2007
Karl J Smith, Sparta, NJ (US);
Paul G Vahey, Seattle, WA (US);
Howard a Fraenkel, Lebanon, NJ (US);
Robert G Bray, Bridgewater, NJ (US);
Nelson W Lytle, Bolingbrook, IL (US);
William R Rapoport, Bridgewater, NJ (US);
Gerald a Smith, Easton, PA (US);
Karl J Smith, Sparta, NJ (US);
Paul G Vahey, Seattle, WA (US);
Howard A Fraenkel, Lebanon, NJ (US);
Robert G Bray, Bridgewater, NJ (US);
Nelson W Lytle, Bolingbrook, IL (US);
William R Rapoport, Bridgewater, NJ (US);
Gerald A Smith, Easton, PA (US);
Honeywell International Inc, Morristown, NJ (US);
Abstract
Systems for preparation of a mark and authentication of a mark vis-a-vis a counterfeit mark. Emission spectra comprising intensity versus wavelength distributions are collected from a series of taggants. One or more taggants is selected from the collected emission data such that the spectra of the selected taggants are distinguishable. The selection is also based on a consideration of the emitted radiation of a substrate and a dispersive medium. The authentication system uses multivariate statistical analysis to calculate at least one measurement statistic of a mark to be authenticated and at least one statistical limit based on a series of training marks prepared by the preparation system. Authenticity of the mark is determined based on a comparison of the measurement statistic and the statistical limit.