The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Dec. 15, 2011
Dai-seung Choi, Daejeon, KR;
Hye-young Jung, Daejeon, KR;
Sung-ho Chun, Daejeon, KR;
Heon Kim, Daejeon, KR;
Sung-don Hong, Daejeon, KR;
Dong-woo Yoo, Daejeon, KR;
Dai-Seung Choi, Daejeon, KR;
Hye-Young Jung, Daejeon, KR;
Sung-Ho Chun, Daejeon, KR;
Heon Kim, Daejeon, KR;
Sung-Don Hong, Daejeon, KR;
Dong-Woo Yoo, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cyclic compound having a high glass transition temperature as a main chain, the thermal stability is excellent, and since the mobility of the main chain is relatively high as compared to that of an additional polymer, a photoreactive group can be freely moved in the main chain of the polymer. Accordingly, it is possible to overcome a slow photoreactive rate that is considered a disadvantage of a polymer material used to prepare an alignment film for known liquid crystal display devices.