The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Sep. 17, 2010
Larry F. Rhodes, Silver Lake, OH (US);
Chun Chang, Stow, OH (US);
Pramod Kandanarachchi, Brecksville, OH (US);
Lawrence D. Seger, Gates Mills, OH (US);
Keita Ishiduka, Kawasaki, JP;
Kotaro Endo, Kawasaki, JP;
Tomoyuki Ando, Kawasaki, JP;
Larry F. Rhodes, Silver Lake, OH (US);
Chun Chang, Stow, OH (US);
Pramod Kandanarachchi, Brecksville, OH (US);
Lawrence D. Seger, Gates Mills, OH (US);
Keita Ishiduka, Kawasaki, JP;
Kotaro Endo, Kawasaki, JP;
Tomoyuki Ando, Kawasaki, JP;
Promerus LLC, Brecksville, OH (US);
Abstract
Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.