The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8329548 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 11, 2012

Filed:

Jul. 15, 2011
Applicants:

Taeg-hyun Kang, Incheon, KR;

Jun-hyeong Ryu, Incheon, KR;

Jong-hwan Kim, Bucheon, KR;

Inventors:

Taeg-hyun Kang, Incheon, KR;

Jun-hyeong Ryu, Incheon, KR;

Jong-hwan Kim, Bucheon, KR;

Assignee:

Fairchild Korea Semiconductor, Ldt., Dodang-Dong, Wonmi-Gu Bucheon-Si, Gyeonggi-Do, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A field transistor for electrostatic discharge (ESD) protection and method for making such a transistor is described. The field transistor includes a gate conductive layer pattern formed on a field oxide layer. Since the gate conductive layer pattern is formed on the field oxide layer, a thin gate insulating layer having a high possibility of insulation breakdown is not used. To form an inversion layer for providing a current path between source and drain regions, a field oxide layer is interposed to form low concentration source and drain regions overlapped by the gate conductive layer pattern.


Find Patent Forward Citations

Kang, Taeg-hyun. (2012). Field transistors for electrostatic discharge protection and methods for fabricating the same (U.S. Patent No. 8329548). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8329548

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