The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2012

Filed:

Feb. 29, 2008
Applicants:

Mark D. Ediger, Madison, WI (US);

Stephen Swallen, Madison, WI (US);

Ken Kearns, Madison, WI (US);

Lian Yu, Madison, WI (US);

Tian Wu, Lake Bluff, IL (US);

Inventors:

Mark D. Ediger, Madison, WI (US);

Stephen Swallen, Madison, WI (US);

Ken Kearns, Madison, WI (US);

Lian Yu, Madison, WI (US);

Tian Wu, Lake Bluff, IL (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K 9/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides vapor deposition methods that overcome the kinetic restrictions imposed by more conventional vapor deposition processes and liquid-cooling techniques to form amorphous molecular solids with greatly enhanced stabilities. The present methods produce amorphous molecular solids having stabilities, as measured by fictive temperature, that cannot be achieved using liquid-cooling methods.


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